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太字は東芝アナリシス株式会社所属

2021年

著者・題目・雑誌・doi
間山 憲仁, 城後 香里, 渡辺 圭, 石村 聡
アトムプローブと走査型透過電子顕微鏡複合分析の実用例紹介と最近の話題
表面と真空, doi:10.1380/vss.64.515
N. Sone, D. Jinno, Y. Miyamoto, R. Okuda, S. Yamamura, Y. Jinno, W. Lu,
D.-P. Han, K. Okuno, K. Mizutani, S. Nakajima, J. Koyama, S. Ishimura, N.
Mayama
, M. Iwaya, T. Takeuchi, S. Kamiyama, I. Akasaki
Analysis of impurity doping in tunnel junction grown on core-shell structure
composed of GaInN/GaN multiple-quantum-shells and GaN nanowire
Japanese Journal of Applied Physics, doi:10.35848/1347-4065/ac3728
M. Okayasu, N. Sahara, N. Mayama
Effect of the microstructural characteristics of die-cast ADC12 alloy controlled by Na and Cu on the mechanical properties of the alloy
Materials Science and Engineering: A, doi.org/10.1016/j.msea.2021.142120
Y. Yamamoto, H. Yamaoka, T. Kawai, M. Yoshida, J. Yamaura, K. Ishii, S. Onari, T. Uozumi, A. Hariki, M. Taguchi, K. Kobayashi, J.-F. Lin, N. Hiraoka, H. Ishii, K.-D. Tsuei, H. Okanishi, S. Iimura, S. Matsuishi, H. Hosono, J. Mizuki
Electronic and crystal structures of LnFeAsO1-xHx (Ln = La, Sm) studied by x-ray absorption spectroscopy, x-ray emission spectroscopy, and x-ray diffraction: Ⅱ pressure dependence
Journal of Physics: Condensed Matter, doi:10.1088/1361-648X/abfaf4
Y. Yamamoto, H. Yamaoka, T. Uozumi, A. Hariki, S. Onari, J. Yamaura, K. Ishii, T. Kawai, M. Yoshida, M. Taguchi, K. Kobayashi, J.-F. Lin, N. Hiraoka, H. Ishii, K.-D. Tsuei, H. Okanishi, S. Iimura, S. Matsuishi, H. Hosono, J. Mizuki
Electronic and crystal structures of LnFeAsO1-xHx (Ln = La, Sm) studied by x-ray absorption spectroscopy, x-ray emission spectroscopy, and x-ray diffraction: part Ⅰ carrier-doping dependence
Journal of Physics: Condensed Matter, doi:10.1088/1361-648X/abf9b9
T. Mizutani, S. Tanaka, T. Saze, K. Fujii, H. Matsuoka, M. Nakano, H. Wadati, M. Kitamura, K. Horiba, Y. Iwasa, H. Kumigashira, M. Yoshiki, M. Taguchi
Total reflection hard X-ray photoelectron spectroscopy: Application to strongly correlated electron systems
PHYSICAL REVIEW B, doi:10.1103/PhysRevB.103.205113

2020年

著者・題目・雑誌・doi
H. Yamaoka, E. F. Schwier, Y. Yamamoto, M. Nakatake, M. Sawada, H. Sakurai, N. Tsujii, M. Arita, H. Iwasawa, M. Taguchi, K. Shimada, J. Mizuki
Electronic and crystal structures of (Na1-xCax)Cr2O4 with anomalous colossal magnetoresistance
PHYSICAL REVIEW B, doi:10.1103/PhysRevB.102.235150
T. Nakano, Y. Harashima, K. Chokawa, K. Shiraishi, A. Oshiyama, Y. Kangawa, S. Usami, N. Mayama, K. Toda, A. Tanaka, Y. Honda, H. Amano
Screw dislocation that converts p-type GaN to n-type: Microscopic study on Mg condensation and leakage current in p-n diodes
Applied Physics Letters, doi:10.1063/5.0010664

2019年

著者・題目・雑誌・doi
T. Kinoshita, T. Muro, T. Matsushita, H. Osawa, T. Ohkochi, F. Matsui, H. Matsuda, M. Shimomura, M. Taguchi, H. Daimon
Progress in photoelectron holography at SPring-8
Japanese Journal of Applied Physics, doi:10.7567/1347-4065/ab4d28
T. Pincelli, R. Cucini, A. Verna, F. Borgatti, M. Oura, K. Tamasaku, H. Osawa, T.-L. Lee, C. Schlueter, S. Gunther, C. H. Back, M. Dell'Angela, R. Ciprian, P. Orgiani, A. Petrov, F. Sirotti, V. A. Dediu, I. Bergenti, P. Graziosi, F. Miletto Granozio, Y. Tanaka, M. Taguchi, H. Daimon, J. Fujii, G. Rossi, G. Panaccione
Transient quantum isolation and critical behavior in the magnetization dynamics of half-metallic manganites
PHYSICAL REVIEW B, doi:10.1103/PhysRevB.100.045118
S. Usami, N. Mayama, K. Toda, A. Tanaka, M. Deki, S. Nitta, Y. Honda, H. Amano
Direct evidence of Mg diffusion through threading mixed dislocations in GaN p-n diodes and its effect on reverse leakage current
Applied Physics Letters, doi:10.1063/1.5097767
M. Taguchi, F. Matsui, N. Maejima, H. Matsui, H. Daimon
Disorder and mixed valence properties of Sr2FeMoO6 studied by photoelectron diffraction and x-ray absorption spectroscopy
Surface Science, doi:10.1016/j.susc.2019.02.001
H. Oomae, M. Shinoda, J.T. Asubar, K. Sato, H. Toyota, N. Mayama, B. Mehdiyev, N. Uchitomi
Spatial distribution of substitutional Mn-As clusters in ferromagnetic (Zn,Sn,Mn)As2 thin films revealed by image
Journal of Applied Physics, doi:10.1063/1.5070074

2018年以前

著者・題目・雑誌・doi
T. Mizuno, Y. Omata, R. Kanazawa, Y. Iguchi, S. Nakada, T. Aoki, T. Sasaki
Nano-SiC region formation in (100) Si-on-insulator substrate: Optimization of hot-C+-ion implantation process to improve photoluminescence intensity
Japanese Journal of Applied Physics, doi:10.7567/JJAP.57.04FB03
T. Kinno, T. Sasaki, M. Tomita, T. Ohkubo
Quantitativeness in laser-assisted atom probe analysis of boron and carbon codoped in silicon
Japanese Journal of Applied Physics, doi:10.7567/JJAP.56.116601
小熊 規泰、坂本 龍、 佐々木 智一、新井 納生美
超高サイクル疲労で形成されたFGAの3D-AP評価
3D-AP Evaluation of FGA Formed in Very High Cycle Fatigue
一般社団法人 日本機械学会, doi:10.1299/jsmesed.2017.16.120
H. Tsuji, M. Kato, N. Mayama, T. Sasaki, E. Nomura, Y. Gotoh
Evaluation of Ge Oxidation State in Ge Nanoparticles Formed in Thin SiO2 Layer by Negative-Ion Implantation and Successive Two-Stage Annealing
Transactions of the Materials Research Society of Japan, doi:10.14723/tmrsj.41.305
T. Yukawa, M. Morita, M. Karasawa, S. Ishimura, N. Mayama, H. Uchida, Y. Kawamura, K.M. Itoh, M. Owari
Reconstruction in Atom Probe Tomography Considering the Cone Angle of Needle-Like Shaped Samples and Evaluation of Reliability
e-Journal of Surface Science and Nanotechnology, doi:10.1380/ejssnt.2015.235
M. Karasawa, M. Fujii, M. Morita, S. Ishimura, N. Mayama, H. Uchida,Y. Kawamura, K.M. Itoh, M. Owari
Investigation of mixing effects of silicon isotopes under shave-off condition using atom probe tomography
Surface and Interface Analysis, doi:10.1002/sia.5645
K. Inoue, H. Takamizawa, Y. Shimizu, F. Yano, T. Toyama, A. Nishida, T. Mogami, K. Kitamoto, T. Miyagi, J. Kato, S. Akahori, N. Okada, M. Kato,Y. Nagai
Three-Dimensional Dopant Characterization of Actual Metal-Oxide-Semiconductor Devices of 65 nm Node by Atom Probe Tomography
Applied physics express, doi:10.7567/APEX.6.046502
T. Sonehara, A. Hokazono, H. Akutsu, T. Sasaki, H. Uchida, M. Tomita, S. Kawanaka, S. Inaba, Y. Toyoshima
Mechanism of Contact Resistance Reduction in Nickel Silicide Films by Pt Incorporation
IEEE Transactions on Electron Devices, doi:10.1109/TED.2011.2166557
Y. Shimizu, Y. Kawamura, M. Uematsu, M. Tomita, T. Kinno, N. Okada, M. Kato, H. Uchida, M. Takahashi, H. Ito, H. Ishikawa, Y. Ohji, H. Takamizawa, Y. Nagai, K. M. Itoh
Depth and lateral resolution of laser-assisted atom probe microscopy of silicon revealed by isotopic heterostructures
Journal of Applied Physics, doi:10.1063/1.3544496
Y. Shimizu, H. Takamizawa, K. Inoue, T. Toyama, Y. Nagai, N. Okada, M. Kato, H. Uchida, F. Yano, T. Tsunomura, A. Nishida , T. Mogami
Impact of carbon coimplantation on boron behavior in silicon: Carbon-boron coclustering and suppression of boron
Applied Physics Letters, doi:10.1063/1.3597303
Y. Shimizu, Y. Kawamura, M. Uematsu, K.M. Itoh, M. Tomita, M. Sasaki, H. Uchida, M. Takahashi
Atom probe microscopy of three-dimensional distribution of silicon isotopes in 28Si/30Si isotope superlattices with sub-nanometer spatial resolution
Journal of Applied Physics, doi:10.1063/1.3236673

[ 更新日:2022/03/30 ]

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