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Physical Property Evaluation Of Thin Films

TNA offers various analysis techniques for the physical structure and property characterization of thin films that help facilitate your R&D and manufacturing process development.

Our service offerings

  • Crystal structure evaluation of ultra-thin (nanoscale) films
  • Identification of nanoscale crystal structures
  • Analysis of the density, thickness, roughness and phase separation (e.g., particle diameter) of ultra-thin films
  • Adhesion evaluation of thin films
  • Analysis of desorbed gas from thin films


  • Crystal structure evaluation of high-k films using a thin-film X-ray diffractometer (XRD)
  • Crystallinity evaluation of ultra-thin films using a high-temperature X-ray diffractometer (XRD)
  • Compound identification of nanoscale contaminant particles using a micro-area X-ray diffractometer (μXRD)
  • Density, thickness and roughness evaluation using an X-ray reflectometer (XRR)
  • Adhesion evaluation using an m-ELT test
  • Composition analysis of desorbed gas from silicon oxide films using a thermal desorption spectroscope (TDS)

Major equipment

  • Power X-ray diffractometer(XRD)
  • Thin-film X-ray diffractometers (thin-film XRD, XRR, small-angle X-ray scattering (SAXS))
  • Micro-area X-ray diffractometer (μXRD)
  • Laser Raman spectrometer
  • Adhesion evaluation system (m-ELT)
  • Thermal desorption spectroscope (TDS)
  • Spectroscopic ellipsometer

Comparison of XRR measurement and simulation results
Comparison of XRR measurement and simulation results

Micro-area X-ray diffractometer (μXRD)
Micro-area X-ray diffractometer (μXRD)

Thermal desorption spectroscope (TDS)
Thermal desorption spectroscope (TDS)

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